Gigaphoton Provides Novel Excimer Laser for ASML Lithography

Gigaphoton, a manufacturer of light sources for the semiconductor industry, announced a new ArF excimer laser, the GT40A, with an emission wavelength of 193 nm and a repetition rate of 4 kHz. This new model has been comprehensively tested and certified using lithographic tools at ASML in Veldhoven, The Netherlands.

In today's advanced lithography methods, with the optimization of LSI circuit models, immersive ArF lithography has become mainstream and will become the most promising next-generation technology. As an ArF laser, the light source for immersion ArF lithography, high yield levels and stable spectral performance are essential.

The GT40A's performance tests conducted at Gigaphoton's Japan headquarters show that it has stable high performance, low operating costs, and unprecedented reliability and long available time - all of these characteristics are sufficient to meet the needs of mass-production lithography programs .